Fig. 4
From: Nano-structured transmissive spectral filter matrix based on guided-mode resonances
Fabrication process flow of a nanofilter array based on GMR, showing the conditions of the sample after a substrate cleaning and plasma enhanced chemical vapour deposition (PE-ALD) of a 100 nm thick Si3N4 layer, b atomic layer deposition (ALD) of a 50 nm thick SiO2 layer, c resist coating, d patterning using electron beam lithography (EBL), e metal deposition, and f photoresist removal