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Table 1 Ion beam process parameters of RIBE investigations on Al905 aluminium disc samples

From: Improvement of the optical properties after surface error correction of aluminium mirror surfaces

Process mode Operating gas Beam energy [eV] Process pressure [Pa] FWHM
[mm]
Beam current [mA] Etch depth
[nm]
Scanning repetitions
RIBE1 N2 1500 8.0 × 10− 4 7.1 4.30 49 1
  N2 1500 8.0 × 10−4 7.2 4.54 196 4
  N2 1500 8.0 × 10−4 7.1 4.36 492 10
  N2 1500 8.0 × 10−4 7.2 4.34 1006 20
  N2 1500 8.0 × 10−4 7.2 4.40 1998 40
RIBE2 N2 1500 8.0 × 10− 4 7.1 4.32 905 20
  O2 1500 1.1 × 10− 3 5.9 1.67 1
  O2 1500 1.1 × 10−3 6.1 1.72 18 3
O2 1500 1.2 × 10−3 5.6 1.63 65 10
  O2 1500 1.1 × 10−3 6.0 1.70 123 20
RIBE planarization N2 1200 1.6 × 10−3 8.4 1.89   9
RIBE finishing O2 1500 1.3 × 10−3 4.3 1.68   1
   600 8.5 × 10−4 6.5 1.15   4
  1. Ion beam machining investigations for the purpose of quantitative comparison of increasing material removal depth (index 1) with almost retained ion beam processing parameter. In the second section (index 2) the subsequent ion beam machining experiments with increasing material removal depths using oxygen operating gas is presented and in section 3 RIBE planarization and O2 finishing at two different beam energies of 0.6 keV and 1.5 keV