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Table 1 Ion beam process parameters of RIBE investigations on Al905 aluminium disc samples

From: Improvement of the optical properties after surface error correction of aluminium mirror surfaces

Process mode

Operating gas

Beam energy [eV]

Process pressure [Pa]

FWHM

[mm]

Beam current [mA]

Etch depth

[nm]

Scanning repetitions

RIBE1

N2

1500

8.0 × 10− 4

7.1

4.30

49

1

 

N2

1500

8.0 × 10−4

7.2

4.54

196

4

 

N2

1500

8.0 × 10−4

7.1

4.36

492

10

 

N2

1500

8.0 × 10−4

7.2

4.34

1006

20

 

N2

1500

8.0 × 10−4

7.2

4.40

1998

40

RIBE2

N2

1500

8.0 × 10− 4

7.1

4.32

905

20

 

O2

1500

1.1 × 10− 3

5.9

1.67

1

 

O2

1500

1.1 × 10−3

6.1

1.72

18

3

O2

1500

1.2 × 10−3

5.6

1.63

65

10

 

O2

1500

1.1 × 10−3

6.0

1.70

123

20

RIBE planarization

N2

1200

1.6 × 10−3

8.4

1.89

 

9

RIBE finishing

O2

1500

1.3 × 10−3

4.3

1.68

 

1

  

600

8.5 × 10−4

6.5

1.15

 

4

  1. Ion beam machining investigations for the purpose of quantitative comparison of increasing material removal depth (index 1) with almost retained ion beam processing parameter. In the second section (index 2) the subsequent ion beam machining experiments with increasing material removal depths using oxygen operating gas is presented and in section 3 RIBE planarization and O2 finishing at two different beam energies of 0.6 keV and 1.5 keV