From: Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold
Thickness (nm)
Temp (K)
Cryst time (min)
n’
10
973
~ 30
–
15
873
8
858
16
2.05
843
55
1.85
20
923
< 2
6
24
50
823
45
2.15