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Table 1 The evaluation of the experiments

From: Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold

Thickness (nm)

Temp (K)

Cryst time (min)

n’

10

973

~ 30

15

873

8

15

858

16

2.05

15

843

55

1.85

20

923

< 2

20

873

6

20

843

24

2.05

50

843

8

50

823

45

2.15