Fig. 2From: Fabrication of perfect plasmonic absorbers for blue and near-ultraviolet lights using double-layer wire-grid structuresFabrication procedure of the double-layer wire-grid structure. a Cleaning the SiO2 substrate and spin coating Hexamethyl disilazane. b Spin coating the electron-beam (EB) resist and antistatic agent. c Patterning using EB lithography and developing the EB resist. d Sputtering metal (Ag)Back to article page