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Table 1 Simulation and fabrication conditions of the wire-grid structures

From: Fabrication of perfect plasmonic absorbers for blue and near-ultraviolet lights using double-layer wire-grid structures

Wavelength λ (nm)

450

375

Metal

Ag

Al

Ag

Al

Period p (nm)

350

350

350

350

Width of resist w (nm)

262.5

122.5

182.0

287.0

Duty ratio w/p

0.75

0.35

0.52

0.82

Thickness of resist h (nm)

100

100

100

100

Thickness of metal t (nm)

80

80

100

100