Fig. 4From: Precise spectrophotometric method for semitransparent metallic thin-film index determination using interference enhancementThree sample scatter plots of 100 n, k and d values for the metallic top layer from fitting against spectra with normally distributed additive (μ=0, σ=0.001) and multiplicative (μ=1, σ=0.001) noise, for the OS stack with a 800 nm dielectric layer and a 40 nm metallic top layer. Top, k against n; mid, n against d; bottom, k against d. The cross on each plot indicates the nominal values used to generate the initial spectrum of n=2.54, k=3.43 and d=40nm. The standard deviation for these data is 0.015 in n, 0.0116 in k and 0.236, corresponding to the first row in Table 1Back to article page