From: Precise spectrophotometric method for semitransparent metallic thin-film index determination using interference enhancement
SiO2 thickness
A
B (μm−1)
C
D (μm)
d (nm)
300
0.546
3.52
4.05
-0.654
28.5
500
0.897
2.99
3.98
-0.685
28.9
800
0.779
3.41
4.13
-0.650
27.2