Fig. 4
From: Design of high performance and low resistive loss graphene solar cells
a Detailed structure of a hybrid Ag-G-SiO2-Si-SiO2 cell including GNR with 0.5 nm height and W = 250 nm width and the Ag nanostrip with 80 nm base length and variable heights of h = 10, 40, and 60 nm. b The absorption enhancements of the hybrid cell for h = 10 nm (dashed red curve), 40 nm (dot dashed green curve), and 60 nm (solid doted violet curve) in comparison with a cell comprising solely a G-SiO2-Si-SiO2 cell (solid blue curve) and Ag-SiO2-Si-SiO2 cell (solid black curve). Distribution of the normalized magnetic field of hybrid cell with h = 10 nm at (c) 506 nm and (d) 620, and h = 60 nm at (e) 497 nm and (f) 659 nm